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Hardmask A hardmask is a material used in semiconductor processing as an etch mask in lieu of polymer or other organic "soft" resist materials. The idea is that polymers tend to be etched easily by oxygen, fluorine, chlorine or other reactive gases to the extent that a pattern defined using polymeric mask is rapidly degraded during plasma etching.
抄文引用元・出典: フリー百科事典『 ウィキペディア(Wikipedia)』 ■ウィキペディアで「Hardmask」の詳細全文を読む
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