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|Section2= |Section3= |Section8= }} Trichlorosilane is an inorganic compound with the formula HSiCl3. It is a colourless, volatile liquid. Purified trichlorosilane is the principal precursor to ultrapure silicon in the semiconductor industry. In water, it rapidly decomposes to produce a silicone polymer while giving off hydrochloric acid. Because of its reactivity and wide availability, it is frequently used in the synthesis of silicon-containing organic compounds.〔Lianhong Xu, Ravi Kurukulasuriya, "Trichlorosilane" Encyclopedia of Reagents for Organic Synthesis, 2006. 〕 == Production == Trichlorosilane is produced by treating powdered metallurgical grade silicon with blowing hydrogen chloride at 300 °C. Hydrogen is also produced, as described in the chemical equation: :Si + 3 HCl → HCl3Si + H2 Yields of 80-90% can be achieved. The major byproducts are silicon tetrachloride (chemical formula SiCl4), hexachlorodisilane (Si2Cl6), and dichlorosilane (H2SiCl2), from which trichlorosilane can be separated by distillation. : It is also produced from silicon tetrachloride: :Si + 3 SiCl4 + 2 H2 → 4 HSiCl3 抄文引用元・出典: フリー百科事典『 ウィキペディア（Wikipedia）』 ■ウィキペディアで「Trichlorosilane」の詳細全文を読む スポンサード リンク
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